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Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology.

Journal article
Authors Byung-Soo Kang
Young-Taeg Sul
Yongsoo Jeong
Eungsun Byon
Jong-Kuk Kim
Suyeon Cho
Se-Jung Oh
Tomas Albrektsson
Published in Medical Engineering & Physics
Volume 33
Issue 6
Pages 730-738
ISSN 0951-8320
Publication year 2011
Published at Institute of Clinical Sciences, Department of Biomaterials
Pages 730-738
Language en
Keywords Metal plasma immersion ion implantation and deposition (MePIIID); Surface chemistry and topography; Titanium implant; Magnesium; Calcium
Subject categories Surface engineering, Material physics with surface physics, Biomaterials


The present study investigated the effect of metal plasma immersion ion implantation and deposition (MePIIID) process parameters, i.e., plasma sources of magnesium and calcium, ion dose, and acceleration voltage on the surface chemistry and morphology of screw-type titanium implants that have been most widely used for osseointegrated implants. It is found that irrespective of plasma ion source, surface topography and roughness showed no differences at the nanometer level; that atom concentrations increased with ion dose but decreased with acceleration voltage. Data obtained from X-ray photoelectron spectroscopy and auger electron spectroscopy suggested that MePIIID process produces ‘intermixed’ layer of cathodic arc deposition and plasma immersion ion implantation. The MePIIID process may create desired bioactive surface chemistry of dental and orthopaedic implants by tailoring ion and plasma sources and thus enable investigations of the effect of the surface chemistry on bone response.

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