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Hole mask colloidal lithography on magnetic multilayers for spin torque applications

Conference paper
Authors Sohrab R. Sani
Johan Persson
Alexandre Dmitriev
Mikael Käll
Johan Åkerman
Published in Journal of Physics Conference Series. International Conference on Magnetism (ICM 2009). Karlsruhe, GERMANY. JUL 26-31, 2009
Volume 200
Pages 072078
ISSN 1742-6588
Publication year 2010
Published at Department of Physics (GU)
Pages 072078
Language en
Subject categories Magnetism


We demonstrate the fabrication of metallic nano-contacts on magnetic multilayers using a Hole Mask Colloidal Lithography technique (HCL) based on Polystyrene spheres. The method applies PMMA as a sacrificial layer upon which a hole pattern is formed after lift- off of the spheres. An Au layer functions as a hard mask for the PMMA and the PMMA subsequently masks the SiO2 during its etching. The resulting pattern is a dense collection of randomly located nano-holes through a SiO2 film. Final devices are made using traditional photolithography to define a 600 nm circular mesa with about 3 to 4 nano-holes per device, and patterning of a metallic top contact.

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